SHORT DESCRIPTION
This project focuses on the design of a technology factory office dedicated to wafer electrostatic adsorption trays, commonly known as Electrostatic Chucks. Recognizing the need for a space that facilitates both testing and research and development of precision materials, the design team opted for an open spatial layout. This choice not only enhances the overall permeability of the environment but also significantly increases flexibility in how the space can be utilized. Moreover, in an effort to transcend the cold and impersonal atmosphere typically associated with traditional technology industries, the designer made a deliberate decision to weave a more humanistic ambiance throughout the office. As a result, the workplace transforms into a harmonious blend of functionality, comfort, and visual appeal, ultimately fostering an inspiring and productive atmosphere for employees. This thoughtful approach not only addresses practical needs but also promotes a positive and engaging work environment. The exterior of the building is elegantly painted in a hue reminiscent of silicon sand, the essential raw material for wafer production. This choice of color is beautifully complemented by a special textured paint, which subtly evokes the rich, earthy tones of nature. Consequently, this design not only highlights the defining characteristics of the technology industry but also embodies a sense of modernity and professionalism. Furthermore, it infuses the space with a warmth that resonates on a human level, creating a captivating fusion of cutting-edge technology and organic textures. In addition, the exterior walls are coated with weather-resistant paint that offers both aesthetic and practical advantages. This innovative finish not only ensures that the facade remains impeccably clean, but it also boasts a remarkable self-cleaning function. Over time, its low-maintenance properties significantly reduce the need for regular cleaning and upkeep, allowing the building to maintain its pristine appearance with minimal effort.
